Massachusetts Institute of Technology
NIST Research Intern
National Institute of Standards and Technology (NIST)
Scanning Kelvin Force Microscopy (SKFM) is a form of noncontact atomic force microscopy (nc-AFM), more specifically an electrostatic force microscopy (EFM) technique, which makes use of the electrostatic forces between the cantilever probe tip and the sample to image and characterize the sample properties at subnanometer scales. Because electrostatic forces occur over long distances SKFM/EFM can be used to characterize subsurface structures, making it useful for imaging/testing 3D integrated circuits. SKFM/EFM is used today for measuring circuit properties such as dielectri constant, accumulated charges, and conductivity variations. I will present on my remote bias EFM simulations which focused on characterizing subsurface aluminum strips
embedded in Silicon Dioxide (SiO2) and Hafnium substrates with varying probe tip geometries.
My name is Rob and I am from a small city called Pharr along the southern border of Texas.
My interests generally lie at the intersection of digital systems/controls design, and physics experimentation.
I am currently finishing up my EECS & Physics degrees at MIT, and hoping to start my Master's of Engineering in Applied Physics in the Fall.
I am an avid percussionist (Jazz & Orchestra), cook, traveler, and more recently a gym rat.